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阳极溅射
anode sputtering
- 用射频磁控溅射法在阳极氧化铝模板表面制备了金属铝膜。
Metal aluminum films were deposited on AAO templates by radio-frequency magnetron sputtering. - 为了开发新型的涂层钛阳极，进行了磁控溅射钽作钛阳极底层的研究。
Magnetron sputtering tantalum (Ta) was studied using as the bottom layer of Ti-coated anode to develop new type anode. - 在玻璃衬底和ITO阳极之间溅射的光学干涉层可以部分消去背景光的反射。
The optical interference layers are deposited between the glass substrate and ITO(indium tin oxide) anode, which could partly suppress the reflection of ambient light.
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