离子束光刻 ion beam lithography
- 林华,"介质膜光栅:光刻胶掩模占宽比和离子束刻蚀槽深的监控",博士论文,导师:李立峰(2006).
Lin H, Li L and Zeng L., "In-situ end-point detection during ion-beam etching of multilayer dielectric gratings", Chin. Opt. Lett. , 3 (2), 63 (2005).
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