英德
有道
百度
谷歌
图片
维基
百科
掩膜
MASK
- EUV掩膜板被自动送入和送出双盒容器(Dual pod)中；其中内层盒可以储存在InSync系统的环境下。
EUV masks are automatically transferred into and out of the dual pod; the inner pod can be stored inside the InSync environment. - 因此目前电子束光刻设备主要的用途是用于刻制掩膜板，许多人甚至认为电子束光刻技术的产出量永远也无法满足芯片量产的需求。
E-beam tools are used in photomask writing, but many believe the technology will never be fast enough for high-volume semiconductor lithography. - 左图是一套Applied Tetra III高级掩膜蚀刻系统，如果掩膜板制造商要开发和生产45纳米的掩膜，就必须得使用这套设备。
On the left is an Applied Tetra III advanced reticle-etch system. This system is used by virtually every maskmaker in the world for the development and production of 45-nanometer masks.
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